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The Utah Nanofab encompasses a class 100/1000/10,000 cleanroom, packaging, and test areas. Commissioned in 2012, the new 18,000 square foot facility provides the specialized custom-built infrastructure, equipment, processes, and expertise necessary for researchers and companies to design, build, and package prototype micro- and nano-scale devices including microfluidic devices. Capabilities include device modeling, design layout, mask fabrication, thin film deposition, patterning, and device packaging including laser microwelding.

The facility and staff serves researchers and companies from the campus and beyond, including faculty and researchers from regional institutions as well as companies who use the facilities to generate proof-of-concept and data supporting new product ideas.

Visionary ideas and inspired creativity have helped the Utah Nanofab become a world leader in the fabrication of neural prosthetics, biomedical microfluidic systems and biosensor chips. The discoveries made in the Nanofab help create life-saving medical devices, faster microchips, and more efficient energy systems, resulting in many scientific publications and new companies. Visit our history page to learn that our roots go all the way back to the fundamental patent on CMOS microelectronic devices.

In response to a pair of proposals from Tony Rollett, the Intel Corporation established in 2007 a parallel computing facility in the Materials Science and Engineering Department whose use is dominated by MRSEC researchers. The parallel facility is particularly useful for the intensive microstructural simulation studies being conducted in the department. This facility is managed by systems engineer Heiskell Rogan and is open to all MSE department and MRSEC researchers. With an upgrade in 2008, the department has added an additional new twenty CPUs, housed in five quad-core blades. The Computer Cluster now has 36 CPUs in total, which permit moderately large scale parallel computation.

The current microfabrication facility contains a contact mask alignment and photoresist exposure system, fume hoods, spin coating station, PDMS mixer and degasser, PDMS bonding equipment (oven, AC oxygen plasma), PDMS hole punch and stereo zoom microscope. The equipment is housed in a 250 sq. ft. class 10,000 clean room. With MRSEC funds we will expand our microfluidic fabrication needs, but we lack work stations dedicated to operating the devices. We are developing a shared facility where users can run chips using either pressure or volume control. The facility will have four stations containing: one advanced microscope, one high-speed camera and two low-resolution video systems. Each station will have a motorized translation stage.

Equipment for evaluating all the important characteristics of polymeric materials is available at the Polymer Characterization Facility. The laboratory is used extensively by the polymer research community, particularly members of CCMR's Interdisciplinary Research Groups and Seed projects and by the Polymers Community at Cornell. The CCMR facilities are run by expert staff who provide training and technical assistance.

The Hill Hall 323 Synthesis Lab has eight fume hoods, two glove boxes, a dynamic vapor sorption measurement system, and a variety of more general laboratory equipment. It is primarily used for ion transport membrane material synthesis and functionalization of silicon nanocrystals.

Affiliated Labs are facilities operated by individual PI's who have a desire to make their capabilities available to others, with the consideration of on-going research. Fees are charged to offset the costs of operation, maintenance, and upgrading. For additional information or to schedule time on the equipment contact Amy VanRoosendaal. We will work with the faculty to determine availability.

For most samples, very little sample preparation is needed. All types of materials, including polymers, clays, metals, and ceramics can be analyzed. Samples can be in powdered, single crystal, thin film or bulk form. X-Ray techniques are completely non-destructive. The CCMR facilities are run by expert staff who provide training and technical assistance. We welcome outside users from both industry and academia.

The Center's research demands state-of-the-art sample surface preparation. Our experiments rely on the ability to prepare very flat, polished surfaces, and to remove very thin sections with a high degree of parallelism. To meet these demands, we have assembled several kinds of polishing, lapping and precision milling instruments. For sectioning of soft metals we have installed a diamond-milling system (Reichert-Jung Polycut E with Ultramiller) capable of the precision removal of ~1 micon layers. A precision spindle polishing machine (Strasbaugh Polishmaster) can be used for mechanical polishing of metal and ceramic samples. We have also acquired a Logitec lapping and polishing system which provides much more rapid polishing action (in comparison with the Strausbaugh polisher) while still maintaining excellent parallelism. Using the Logitec system, we are able to polish samples flat to within ?? 0.5 microns over distances of 1 cm and are able to remove thicknesses as small as 5 microns. The facility also includes optical microscopes, an electropolisher for the finishing of metallic specimens, and an inductively coupled gauge head to determine sample parallelism and the thickness of removed layers. Facilities for the preparation of thin metal film specimens for OIM and TEM studies are maintained in Barmak's laboratory and available for MRSEC research.

The electron microscope facility continues to serve the research and teaching needs of faculty and graduate students in the physical sciences. It operates as a cost center with users from inside the university as well as access to local industry and outside universities. The facility is administered by IMNI with a faculty director (Prof. David Paine), and a full time dedicated research engineer (Anthony McCormick) who maintains the equipment and provides instruction or user assistance on an as-needed basis. The laboratory instrumentation consists of equipment which provides five primary functions:

• (i) Two transmission electron microscopes (JEM 2010-HREM tool and an FEI CM20-analytical tool) for chemical, structural, and crystallographic microstructure analysis,
• (ii) Scanning Electron microscopes (LEO 1530-vp and JEM 845) for microstructural studies of surface relief and morphology and includes crystallographic (EBSD) and chemical (EDS) mapping,
• (iii) a new FEI Helios Dual Beam FIB with an Omniprobe nanomanipulator and autoTEM sample preparation, Nabbity extended lithography package, 3-D EBSD, and accessories for high resolution lithography,
• (iv) Auger/ESCA system VG ESCA Lab II for surface composition, depth profile, and XPS analysis and,
• (v) full sample preparation facilities including optical microscopes, ion mills, and plasma deposition tools. In addition, optical and atomic force microscopes are available in the facility. Funding has been secured for the acquisition of a 200 kV Field Emitter TEM which should be ready for installation by June 2010.

The GRL 231 Characterization Lab has a variety of apparatus for characterizing the optical and electronic properties of materials. These include photoluminescence spectroscopy, thermal deflection spectroscopy, electron spin resonance spectroscopy, fourier transform infrared spectroscopy and spectrophotometry. This lab is shared with the Scales Research Group, which studies terahertz spectroscopy techniques.