Shared Materials Instrumentation Facility (SMIF) includes advanced characterization facilities and clean rooms for analysis and fabrication of advanced materials and devices. In the Fall of 2012, a Small Angle X-Ray Scattering (SAXS) Instrument will be added to the facility.
Instrumentation:
- Bake Oven
- DC Sputter System
- Digital Hot Plate
- Digital Instruments Scanning Probe Microscope
- Dry Oxidation
- E-beam & Thermal Metal Evaporator
- E-Beam Lithography System
- E-Beam Metal Evaporator
- Ellipsometer
- Film Thickness Measurement System
- Flip Chip Bonder
- Fluorescence Microscope with Camera
- Frontside/Backside Mask Aligner
- Glove Box
- High Temperature Anneal N-type doping
- Hydrogen anneal
- III-V Reactive Ion Etcher
- Kratos X-Ray Photoelectron Spectrometer
- LabRam Raman/PL Microscope
- Low Temp Anneal and High Temp Anneal for P-type doping
- Manual Microscope with Camera
- Mask Aligner
- Nicolet FT-IR Spectrometer
- Nomarski Microsope with Camera
- Oxide/Nitride/Polymer Reactive Ion Etcher
- PDMS Oven
- Plasma Asher
- Plasma Enhanced Chemical Vapor Deposition System
- Probe Station
- Profilometer
- Rapid Thermal Anneal System
- RF Dielectric Sputter System
- SAXS/WAXS/GISAXS
- Silicon Deep Reactive Ion Etcher
- Vacuum Bake Oven
- X-Ray Diffractometer
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