The Nanoscale Fabrication Center (NFC) at the University of Wisconsin-Madison provides a research facility for microfabrication technologies, products and innovations. In order to give students a state-of-the-art education and to maintain leading-edge research programs, we continue to improve this advanced laboratory.
NFC maintains a suite of semiconductor and microfabrication processing equipment in a cleanroom laboratory. Access to the lab and to all equipment is available to qualified users from the University of Wisconsin, other education institutions, or industry. WCAM is a cost recovery facility.
The laboratory is located on the third floor of the Engineering Centers Building on the University of Wisconsin-Madison campus. Click here for a searchable UW campus map, or return to the NFC home page for more contact information.
For use, questions or more information, please contact the DIrector of MRSEC facilities:
Dr. Jerry Hunter (jerry.hunter@wisc.edu)
(608) 263-1073
- Four-Point Probe
- Aligner for EV 801 Bonder
- Aluminum Wedge Bonder
- Anneal Oven
- Anneal Oven
- Automegasamdri 915B Critical Point Dryer
- Buffered Oxide Etch Chemical Bench
- Chemical Bench
- Chemical Bench ("DAE Bench")
- Chemical bench (Prefurnace Clean)
- Chemical bench for teaching
- Chemical bench for teaching
- Contact Aligner / IR Back Side Aligner
- Contact Aligner / IR Back Side Aligner
- Contact Aligner, 3" wafers;
- Contact Aligners for 4-inch Wafers
- DC Sputterer
- Dicing Saws
- Die Attacher
- E-beam Evaporator
- E-Beam Evaporator
- E-beam Evaporator
- Elionix ELS-G100 Electron Beam Lithography System
- Fiji G2 Atomic Layer Deposition System
- Film Stress Measurement
- Filmetrics
- Forming Gas Metal Anneal Furnace
- Furnace Tube 1
- Furnace Tube 3
- Furnace Tube 4
- Furnace Tube 6
- General-Use Steam Oxidation Furnace Tube 2
- Gold Ball Bonder
- Heidelberg DWL 66+ laser writer lithography system
- high-density plasma RIE
- III-V Semiconductor Chemical Bench
- Indium Evaporator
- Lithography Ovens
- Low-Temperature Oxide Furnace
- Metal Etcher
- Non-Litho Spinner
- Optical microscope with Camera and PC
- Optical microscope with Camera and PC
- Photoresist spincoater for teaching
- Piranha Bench
- PLA-501 Contact Aligner;
- Plasma Asher & Stripper
- Plasma Therm Apex SLR ICP plasma etching system
- PlasmaTherm
- Polysilicon LPCVD Furnace
- Probe Station
- Programmable Photoresist Spinner #2 - SU8
- Programmable Photoresist Spinners #1 and #3 - General Use
- Programmable Polymer Oven
- Programmable Polymer Oven
- Projection Litho Exposure Stepper
- Rapid Thermal Annealer
- Reactive-Ion Etcher
- RF/DC Sputterer
- Silicon Deep RIE
- Silicon Wet Etch Bench
- Solvent Bench
- Solvent Benches
- Spin-Rinse Dryer
- Spin-Rinse Dryer
- Spin-Rinse Dryer
- Spin-Rinse Dryer (SRD)
- SU8 Solvent Bench
- Surface Profilometer (3 units)
- Thermal Anneal Furnace for Metals ("Aluminum Anneal Tube")
- Unaxis 790 RIE
- UV-Ozone Stripper/Cleaner
- Wafer Bonder
- Wafer Scribe
- Wet/Dry Oxidation Furnace
- Wet/Dry Oxidation Tube, Classroom Bay