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The Nanoscale Fabrication Center (NFC)

The Nanoscale Fabrication Center (NFC) at the University of Wisconsin-Madison provides a research facility for microfabrication technologies, products and innovations. In order to give students a state-of-the-art education and to maintain leading-edge research programs, we continue to improve this advanced laboratory.

NFC maintains a suite of semiconductor and microfabrication processing equipment in a cleanroom laboratory. Access to the lab and to all equipment is available to qualified users from the University of Wisconsin, other education institutions, or industry. WCAM is a cost recovery facility.

The laboratory is located on the third floor of the Engineering Centers Building on the University of Wisconsin-Madison campus. Click here for a searchable UW campus map, or return to the NFC home page for more contact information.

For use, questions or more information, please contact the DIrector of MRSEC facilities:

Dr. Jerry Hunter (

(608) 263-1073

  1. Four-Point Probe
  2. Aligner for EV 801 Bonder
  3. Aluminum Wedge Bonder
  4. Anneal Oven
  5. Anneal Oven
  6. Automegasamdri 915B Critical Point Dryer
  7. Buffered Oxide Etch Chemical Bench
  8. Chemical Bench
  9. Chemical Bench ("DAE Bench")
  10. Chemical bench (Prefurnace Clean)
  11. Chemical bench for teaching
  12. Chemical bench for teaching
  13. Contact Aligner / IR Back Side Aligner
  14. Contact Aligner / IR Back Side Aligner
  15. Contact Aligner, 3" wafers;
  16. Contact Aligners for 4-inch Wafers
  17. DC Sputterer
  18. Dicing Saws
  19. Die Attacher
  20. E-beam Evaporator
  21. E-Beam Evaporator
  22. E-beam Evaporator
  23. Elionix ELS-G100 Electron Beam Lithography System
  24. Fiji G2 Atomic Layer Deposition System
  25. Film Stress Measurement
  26. Filmetrics
  27. Forming Gas Metal Anneal Furnace
  28. Furnace Tube 1
  29. Furnace Tube 3
  30. Furnace Tube 4
  31. Furnace Tube 6
  32. General-Use Steam Oxidation Furnace Tube 2
  33. Gold Ball Bonder
  34. Heidelberg DWL 66+ laser writer lithography system
  35. high-density plasma RIE
  36. III-V Semiconductor Chemical Bench
  37. Indium Evaporator
  38. Lithography Ovens
  39. Low-Temperature Oxide Furnace
  40. Metal Etcher
  41. Non-Litho Spinner
  42. Optical microscope with Camera and PC
  43. Optical microscope with Camera and PC
  44. Photoresist spincoater for teaching
  45. Piranha Bench
  46. PLA-501 Contact Aligner;
  47. Plasma Asher & Stripper
  48. Plasma Therm Apex SLR ICP plasma etching system
  49. PlasmaTherm
  50. Polysilicon LPCVD Furnace
  51. Probe Station
  52. Programmable Photoresist Spinner #2 - SU8
  53. Programmable Photoresist Spinners #1 and #3 - General Use
  54. Programmable Polymer Oven
  55. Programmable Polymer Oven
  56. Projection Litho Exposure Stepper
  57. Rapid Thermal Annealer
  58. Reactive-Ion Etcher
  59. RF/DC Sputterer
  60. Silicon Deep RIE
  61. Silicon Wet Etch Bench
  62. Solvent Bench
  63. Solvent Benches
  64. Spin-Rinse Dryer
  65. Spin-Rinse Dryer
  66. Spin-Rinse Dryer
  67. Spin-Rinse Dryer (SRD)
  68. SU8 Solvent Bench
  69. Surface Profilometer (3 units)
  70. Thermal Anneal Furnace for Metals ("Aluminum Anneal Tube")
  71. Unaxis 790 RIE
  72. UV-Ozone Stripper/Cleaner
  73. Wafer Bonder
  74. Wafer Scribe
  75. Wet/Dry Oxidation Furnace
  76. Wet/Dry Oxidation Tube, Classroom Bay