The Materials Research Center (MRC) cleanroom facility is devoted to materials processing, growth, device fabrication, characterization and electronic & photonic materials. The MRC cleanroom complex in Cook Hall provides microfabrication and thin film processingcapabilities. Facility includes class 100 and 1000 cleanrooms. The facility provides microfabrication tools for general use by the Northwestern community, government and industrial researchers. Various techniques are available for the growth, preparation and processing of a wide range of thin film materials including in-process characterization. Training of equipment and assisted use within the MPMF is available to provide the necessary expertise.
This provides a centralized resource for the deposition of metal, semiconductor & dielectric thin films, photolithography, and processing. Standard microfabrication processes have been established. Available techniques include plasma enhanced chemical vapor deposition, e-beam evaporation, atomic layer deposition, reactive ion etching, photolithography, bonding, rapid thermal processing, Hall Effect Measurement and some characterization instrumentation.
- Annealing Tube Furnace
- Atomic Layer Deposition (ALD)
- Chemical Hoods
- Convection Ovens
- Digital Baking Plates
- Edwards Auto 306 e-beam Evaporator
- Edwards Auto 500 FL400 e-beam Evaporator
- Filmetrics F-20 Thin Film Analyzer
- Hall Effect Measurements
- Headway Spinners-Programmable
- Kulicke & Soffa 4524D Ball-Ball Wire Bonder
- Metricon 2010 Prism Coupler
- Microscope
- Nanomaster NPE4000 Plasma Enhanced Chemical Vapor Deposition (PECVD)
- Omano Microscope
- Oxford Instruments P 80 Plasma Enhanced Chemical Vapor Deposition(PECVD)
- Oxford Instruments P 80 Reactive Ion Etcher (RIE)
- Photolithography Wet Bench
- Quintel Q-2000 Mask Aligner
- Quintel Q-4000 Mask Aligner (0.5 m)
- Rapid Thermal Processor
- Samco RIE-10NR Reactive Ion Etcher (RIE)
- SUSS MicroTek MABA6 Mask Aligner
- Tencore P-10 Surface Profiler
- West Bond 7374E Wedge-Wedge Wire Bonder