CRISP, the Yale MRSEC, has constructed a safe, user-friendly, oxide molecular beam epitaxy facility that is simple enough for effective use by undergraduates, yet capable of preparing research-grade samples
Yale University Highlights
May 16, 2008
Growth of epitaxial oxides on silicon(100): the role of strontium [Research]
Understanding the locations of atoms as they are deposited on a surface is critical for growing interfaces of electronic device quality.
July 19, 2007
Plasmon Propagation along Metallic Nanostructures [Research]
Nanoscale metallic structures are promising platforms for sensors: using photons to launch surface plasmon “polaritons”, metallic nanowires can guide and re-emit light over tens of microns. The re-emission of light at the other end of a nanowire can be promoted or altered by adsorption of molecules.
Using silver nanowires synthesized in solution and fabricated by electron-beam […]
July 19, 2007
Crystalline oxides on silicon [Research]
Researchers at Yale University have invented a high-performance material for future generations of transistors and devices. New oxide materials are required to make faster computer chips for the future. These new oxides will replace the oxide that has been the standard for the last 50 years, silicon dioxide. To replace silicon dioxide, […]
June 22, 2006
Prediction of step stability on metal oxides [Research]
The atomic structure along step edges on metal oxide surfaces is crucial for the growth of overlayers in complex oxide devices. No experimental techniques are yet capable of resolving that structure. Theoretical calculations of step structures on metal oxides are complex and have not been reported to date.
By taking into account both the […]
