The increased speed and power of microelectronic devices has come from a steady reduction in the size of their constituent features, which has been achieved by using progressively shorter wavelengths for the photolithography used in their fabrication. Today, the most advanced production photolithography uses 193 nm ultraviolet (UV) light from an ArF excimer laser. At […]
Industry Highlights
February 8, 2007 :: Princeton University
Industry/International: Nanowire Grids Polarize Ultraviolet Light
January 25, 2007 :: Massachusetts Institute of Technology
A New MIT-Wide Vehicle for MRSEC Knowledge Outreach
The MIT MRSEC, in collaboration with the Materials Processing Center (MPC) and the Department of Materials Science and Engineering (DMSE), has launched a new MIT-wide materials website…
January 25, 2006 :: Massachusetts Institute of Technology
Symposium Highlights New Research Developments
In October 2005, a “Materials Day at MIT” outreach symposium was held that focused on new research developments from the MIT MRSEC program.