Processing @ University of Alabama
Used for: | Materials Processing/ Preparation |
- Two Clean Rooms
- Vac-Tec Four Target RF-DC Multilayer Sputtering System
- Key Four Target RF-DC Sputtering System
- 10 target Ultra-Clean Magnetron Sputtering System with insitu Auger Analysis
- 8 target Ultra-Clean Magnetron Sputtering System with insitu RHEED Analysis
- Electron Beam Evaporation System
- Vacuum Annealing System
- Veeco Ion Mill
- Quintel Contact/ Proximity Mask Aligner
- Wire Bonder
- March Instruments Plasma Etcher
- Energy Sciences Electron Beam Processor
- Pilot Tape Coating System
- Tape Calendar and Slitter
- Dispersion Mills
- Planetary Mixer
- Tenny Environmental Chamber
- Headway Model EC101 Spin Coater