Integrated Microscopy Facilities @ Cornell University

The Integrated Microscopy Facility provides a variety of electron and optical microscopes for imaging small features and for microanalysis of the elemental composition of materials. The facility is operated by three expert managers who have many years of combined experience in advanced microscopy. Instruments in this facility include: Leica 440 SEM: 4.5 nm resolution at 30KV. Electron backscattered diffraction allows for crystallographic analysis (texture analysis), while an x-ray detector allows for elemental analysis. LEO 1550 Field-Emission SEM (FE-SEM): Imaging at very high resolution (1nm at 20keV and 2.5nm at 5keV) is possible with this instrument, which utilizes a Schottky Field Emitter. JEOL 8900 EPMA Microprobe: Used for quantitative elemental analysis of features as small as 1 ??m JEOL 1200 EX TEM: Microscope with 0.3 nm resolution for analysis of routine specimens (including inorganic, biological and polymeric samples) FEI Tecnai G20 TEM/STEM: 200 kV microscope with 1 ??/1.4 ?? resolution in TEM/STEM mode. Equipped with an electron energy loss spectrometer for elemental analysis UHV-STEM: Quantitative, digital imaging and spectroscopy of materials at very high spatial and energy resolution are routinely performed on the UHV-STEM. Electron-energy loss spectroscopy, x-ray analysis, annular dark field imaging and convergent beam electron diffraction are all available. Dual-bead FIB: Coming in April 2007! Allows for three-dimensional machining and imaging of materials at the nanoscale by combining a focussed ion beam with a scanning electron microscope. In addition to the electron microscopes, a wide variety of sample preparation equipment and optical microscopes are also available. The CCMR facilities are run by expert staff who provide training and technical assistance. We welcome outside users from both industry and academia. Potential users are encouraged to contact us by e-mail or visit the facility on the web.