Shared Facilities

This facility is equipped with state-of-the-art optical microscopes and micromanipulation capabilities.

(1) Focused Ion Beam system
(2) Cluster-deposition system …

(1) Quantum Design SQUID Magnetometers
(2) Alternating Force Gradient Magnetometer …

Main equipment:
(1) JEOL JEM 2010 Transmission Electron Microscope
(2) JEOL JSM 840A Scanning Electron Microscope
(3) VG Microscopes HB501 STEM

Two sputtering systems have been established to fabricate a variety of thin films, especially the nanostructured films including overlayers, multilayers, granular solids, clusters, etc.

Mechanical testing facilities include hardness testing equipment such as regular and superficial Rockwell, Knoop, and Vickers testers. Other testing facilities include a MTS 20,000 lb. servo-hydraulic material testing system, an Instron 10,000 lb. tensile testing machine, Satec 100,000 and 400,000 lb. machines, and Tinius-Olson instrumented Charpy impact and torsion testers.

Digital Instruments Nanoscope IIIa Dimension 3100 Scanning Probe Microscopy (SPM) Facility provides nanometer-scale characterization of materials by using Scanning Tunneling Microscopy (STM), Atomic Force Microscopy (AFM), and Magnetic Force Microscopy (MFM).

(1) Spin-polarized inverse photoemission and angle-resolved inverse photoemission
(2) UV and Soft X-ray CVD
(3) ESCA and angle-resolved XPS

The X-Ray Characterization Facility is dedicated to materials identification and characterization through non-destructive, X-Ray Diffraction (XRD) and/or X-Ray Fluorescence (XRF) techniques.

The facility is dedicated to materials identification and characterization through single crystal X-Ray diffraction (SCD) analysis.